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Analysis Technique |
Contents |
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Product appearance check |
Product appearance observation by the optical microscope |
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Open/short check |
Open and shorted Leads investigation
Leak of Leads investigation
the Voltage-proof check of Leads protection / output circuit |
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Electrical property check (Go - No-Go) |
Quality judgment
Measurement of LOG data |
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Electrical property check (detailed evaluation) |
Voltage / frequency operation margin evaluation
Temperature characteristic evaluation (-70℃ - 225℃)
Test data recombination / detailed evaluation
Data extraction / analysis |
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Electrical property check (used Probe) |
Measurement used Manual Probe |
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Electrical property check(others) |
Parameter measurement using various measuring instruments |
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Logic analysis |
LOG data decipherment
Narrow failure part down (*1) |
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X-ray fluoroscopy investigation |
Inner lead bonding wire form investigation
Die position / paste coverage investigation
Internal void investigation
Length measurement using x-ray |
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Package opening processing |
Opening of IC sealed by plastic
Opening of IC sealed by glass
Opening of IC sealed by metal welding
Opening of COB / opening of card IC
Opening of BGA (by hot sulfuric acid) |
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Tip appearance observation |
Appearance observation of the tip by the optical microscope
Length / Thickness measurement (focal method) |
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Analysis of the liquid crystal applying method |
Inquiry of the current leak part by the liquid crystal applying method |
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Low sensitivity emission analysis (night viewer) |
Analysis of the junction destruction by photograph emission detection
Analysis of the oxidization film (insulated film) destruction by photograph emission detection
Analysis used the LSI tester together |
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SEM observation |
Observation of surface from using the secondary electronic image (inclination observation is possible)
Length measurement between 2 points |
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XMA Analysis |
Qualitative analysis, (foreign substances, etc)
Observation of foreign substances distribution situation(Plane / Line analysis) |
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RIE Processing |
Isotropic etching of silicone compounds
Removal of epoxy coverage (Thin film) |
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Chemical Treatment |
Chemistry etching using chloride, sulfuric acid, nitric acid, and aqua regia |
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Cross-sectional Analysis |
Section, Polish, and Sectional observation of Products / tips
Horizontal section polish and Sectional observation of CSP / Flip chip(After resin embedded processing) |
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Circuit and Logic Simulation |
Presumption of the internal fault part from electric failure condition
Correlation verification of internal fault and electric failure condition
Circuit Restoration (*1) |
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Analysis View |
Presumption of the cause of failure
Report Creation |